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Planar magnetron plasma devices and applications by Villamayor, Michelle Marie S.
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Performance of plasma cathode for a magnetized sheet plasma device by Fernandez, Marcedon S., Doi, Kenta, Malapit, Giovanni M., Villamayor, Michelle Marie S., Wada, Motoi, Ramos, Henry J.
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Effects of negative Ag ions on the surface of (200) single-crystalline MgO substrates by Malapit, Giovanni M., Bugante, Jan Isaac L., Mahinay, Christian Lorenz S., Wada, Motoi, Ramos, Henry J.
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Sheet plasma configurations suitable for materials processing by Ramos, Henry J., Doi, Kenta, Fernandez, Marcedon S., Malapit, Giovanni M., Sasao, Mamiko, Villamayor, Michelle Marie S., Wada, Motoi
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Formation of nanopillars on 4H-SiC via self-masking CF4 plasma etching in a gas disharge ion source by Gines, Arnold Rey B.
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Influence of C-Defects on enhanced nucleation of AL IN ON SI (100) : 2x1 a kinetic Monte Carlo study by Albia, Jason Rayala
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Carbide and DLC synthesis within the Ti-Al-C system via sputter deposition by Viloan, Rommel Paulo Basence
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8
Plasma
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9
Electrostatic energy analyzer measurements of low energy zirconium beam parameters in a plasma sputter-type negative ion source by Malapit, Giovanni M., Mahinay, Christian Lorenz S., Poral, Matthew D., Ramos, Henry J.
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Simulation studies on different types of plasma devices by Lee, Henry Victorio Jr
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Plasma (Ionized gases)
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Magnetrons
Materials
Monte Carlo method
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Plasma etching
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