Applications of plasma processes to VLSI technology

Applications of plasma processes to VLSI technology

Bibliographic Details
Other Authors: Sugano, Takuo 1931-, Kim, Hyo-Gun
Format: Book
Language:English
Published: New York Wiley c1985.
Subjects:
Integrated circuits > Very large scale integration > Design and construction.
Plasma etching.
Semiconductors > Etching.
Vapor-plating.